Zhang, X., J. Yan, B. Vermerire, F. Shadman, and J. Chae. 2009. Passive Wireless Monitoring Wafer Cleanliness during Rinsing of Semiconductor Wafers. IEEE Sensors (accepted for publication).
Yan, J., K. Dhane, B. Vermeire, and F. Shadman. 2009. In situ and real-time metrology during rinsing of micro- and nano-structures. Microelectronic Engineering 86: 199-205.
Juneja, H. S., J. P. Yao, and F. Shadman. 2009. Effect of Sampling Line Characteristics on the Dynamic Monitoring of Fluid Concentrations. Industrial & Engineering Chemistry Research 48: 5481-5488.
Yao, J., A. Iqbal, H. Juneja, and F. Shadman. 2007. Moisture uptake and outgassing in patterned and capped porous low-k dielectric films. Journal of the Electrochemical Society 154: G199-G206.
Iqbal, A., H. Juneja, J. P. Yao, and F. Shadman. 2006. Removal of moisture contamination from porous polymeric low-k dielectric films. Aiche Journal 52: 1586-1593.
Juneja, H. S., A. Iqbal, J. P. Yao, and F. Shadman. 2006. Mechanism and kinetics of nonequilibrium and multilayer adsorption and desorption of gases on solids. Industrial & Engineering Chemistry Research 45: 6585-6593.
Philipossian, A., F. Shadman, P. Levy, S. Tousi, B. Gotlinsky, W. S. Rader, P. Lefevre, and I. Koshiyama. 2005. Characterizing recycled fumed silica slurries in ILD CMP applications. Micro 23: 71-+.
Beaudoin, S. P., R. M. Content, L. Losey, and F. Shadman. 2004. Special section on microelectronics manufacturing: Prosperity and environmental stewardship. Ieee Transactions on Semiconductor Manufacturing 17: 481-482.
Raghu, P., C. Yim, A. Iqbal, F. Shadman, E. Shero, and M. Verghese. 2004. Mechanistic study of surface contamination of dielectric oxides using isotope labeling. Industrial & Engineering Chemistry Research 43: 2977-2985.
Raghu, P., C. Yim, F. Shadman, and E. Shero. 2004. Susceptibility of SiO2, ZrO2, and HfO2 dielectrics to moisture contamination. Aiche Journal 50: 1881-1888.
Firefox 3,
Internet Explorer 7, and
Apple Safari at a 1024x768 or higher resolution.
